Tube furnace CVD device
This single device can achieve the generation of long-length powder CNTs, the growth of vertically oriented CNTs on substrates, and the deposition of carbon films on powder sample surfaces.
Optionally, by adding introduction units for ammonia gas and other CVD gases, as well as introduction units for solid or liquid precursors for CVD reactions, it is also possible to perform nitriding treatment and film formation of chalcogenide layered materials.
- Company：マイクロフェーズ
- Price：5 million yen-10 million yen
